发明名称 Exposure apparatus.
摘要 <p>An exposure apparatus includes an exposure light source (13) for projecting a flux of light (14) to be used for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body (40) of the exposure apparatus; illuminance detectors (61) disposed at least at two points inside the exposure light flux (16) but outside the exposure zone; and a detecting device (62) for detecting a change in intensity of the exposure light and a change in relative position of the exposure zone and the exposure light flux, on the basis of detected illuminances at the two points.</p>
申请公布号 EP0421746(A2) 申请公布日期 1991.04.10
申请号 EP19900310798 申请日期 1990.10.03
申请人 CANON KABUSHIKI KAISHA 发明人 WATANABE, YUTAKA, C/O CANON KABUSHIKI KAISHA;EBINUMA, RYUICHI, C/O CANON KABUSHIKI KAISHA;MIZUSAWA, NOBUTOSHI, C/O CANON KABUSHIKI KAISHA;UZAWA, SHUNICHI, C/O CANON KABUSHIKI KAISHA;KARIYA, TAKAO, C/O CANON KABUSHIKI KAISHA
分类号 G03F7/20 主分类号 G03F7/20
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