发明名称 |
Pattern generation system |
摘要 |
An improved pattern generation system. The pattern generation system of the present invention discloses an improved optical system for correcting problems of astigmatism and ellipticity in a radiant energy beam used for generating patterns on a workpiece. The present invention further discloses improved control circuitry for controlling modulation of said beams. The control circuitry corrects for problems of isofocal bias caused by non-linearities in the turn-on/turn-off of the beams.
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申请公布号 |
US4956650(A) |
申请公布日期 |
1990.09.11 |
申请号 |
US19880237753 |
申请日期 |
1988.08.26 |
申请人 |
ATEQ CORPORATION |
发明人 |
ALLEN, PAUL C.;TEITZEL, ROBIN;THOMAS, TIMOTHY |
分类号 |
G02F1/11;B23K26/06;B23K26/073;G02B27/09 |
主分类号 |
G02F1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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