| 摘要 |
A system for maintaining the focus of an exposure tool includes an exposure tool and an analysis system. The exposure tool is configured to generate a sample for determining a product best center of focus, generate a first sample for determining an initial exposure tool focus, and generate a second sample for determining a second exposure tool focus. The analysis system is configured to determine an exposure tool delta baseline based on the product best center of focus and the initial exposure tool focus, set the exposure tool focus to the product best center of focus, determine a recommended focus based on the delta baseline and the second exposure tool focus, and set the exposure tool focus based on the recommended focus.
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