发明名称 Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom
摘要 A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the invention exhibits a wide processing latitude since different holding times do not cause any changes with respect to the development times. A high structural resolution is obtained with various developers <IMAGE> (I)
申请公布号 US4946759(A) 申请公布日期 1990.08.07
申请号 US19880243792 申请日期 1988.09.13
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 DOESSEL, KARL-FRIEDRICH;DAMMEL, RALPH;LINGNAU, JUERGEN
分类号 C07C43/315;C07C43/32;C07C45/72;C07C49/84;G03C1/72;G03F7/004;G03F7/039;H01L21/027;H01L21/30;H05K3/06 主分类号 C07C43/315
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