| 摘要 |
<p>Light-sensitive novolac resins and photoresist compositions containing the same are described. The light-sensitive novolac resins are derived by the reaction of a cresol-formaldehyde novolac resin of low molecular weight (500-1500) with a 2-diazo-1,2-naphthoquinone-sulfonyl halide. Positive-acting photoresist compositions containing these light-sensitive resins in combination with a non-light-sensitive novolac resin in a ratio by weight of 1:1 to 1:5 give rise, upon imagewise exposure to light followed by development using an alkaline developer, to resist images exhibiting high contrast, high sub-micron resolution and substantially vertical sidewalls.</p> |
