发明名称 COMPOSITION SUITED FOR ORGANIC THICK FILM RESISTANCE ELEMENT
摘要 <p>PURPOSE:To provide a composition which can give an organic thick film resistance element excellent in stability, etc., by dispersing a thermosetting resin comprising a tetracarboxylic acid dianhydride, diaminodiphenylmethane, a lactam compound and carbon in a dispersing medium such as an alcohol. CONSTITUTION:A thermosetting resin composed of tetracarboxylic acid dianhydrides of formula I and/or, diaminodiphenylmethane and/or diaminodiphenyl sulfone and a lactam compound (e.g., gamma-butyrolactam) and carbon (e.g., acetylene black) are dispersed in a dispersing medium such as an alcohol and/or a ketone. The obtained paste 16 is applied between electrodes 14 and 14 provided on a substrate 10 to form an organic thick film resistance element. In this way, a resistance element which scarcely suffers any change in its resistance value even when subjected to long-term heating can be obtained.</p>
申请公布号 JPH0238459(A) 申请公布日期 1990.02.07
申请号 JP19880188330 申请日期 1988.07.29
申请人 MITSUI PETROCHEM IND LTD 发明人 TOMINAGA KAORU;SAKURABA TSUKASA
分类号 C08K3/04;C08L21/00;C08L79/08;H01C7/00 主分类号 C08K3/04
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