摘要 |
PURPOSE:To form multilayered films on both sides of a substrate by a single evacuation by setting a partition plate to prevent the interference of a plurality of vapor depositing sources with each other and by rotating the substrate in the evacuated system from the outside of the system. CONSTITUTION:A substrate support 12 holding a fixed substrate 1 is arbitrarily rotated from the outside of a bell jar 7 through a cylinder 9 attached to the jar 7. Materials required to deposit vapor on both sides A, B of the substrate 1 are put in a plurality of vapor depositing sources 15, 16. A partition plate 17 is set between the sources 15, 16 to prevent the interference of them with each other during vapor deposition. Using this apparatus, multilayered thin films are formed on both sides of the substrate by only a single evacuation. |