| 摘要 |
PURPOSE:To obtain the title composition suitable for a permanent resist and a machine plate material by incorporating a specified polyfunctional epoxy resin, a vinylether compd. and a photocationic polymerization initiator in said composition. CONSTITUTION:The image forming resin composition is incorporated with the polyfunctional epoxy resin A which contains an aromatic ring or a cyclohexane ring in a molecule, and does not contain an ether and an amino bindings, the vinylether compd. B which contains at least two vinylether groups in one molecule, and the photocationic polymerization initiator C. The component A is composed of a bisphenol type epoxy resin, etc., and preferably, has a number-average mol.wt. of <=3,000 and a softening point of >=40 deg.C, and is a solid at a normal temp. The component B is exemplified by preferably a divinylether compd. having the mol.wt. of 150-2,000. The component C is composed of a compd. which generates an active seed capable of initiating a cationic polymerization by decomposing said compd. with the irradiation of active rays such as a UV ray. When said component C is composed of said compd., the component C is not specified. Thus, said composition, usable for the permanent resist and the machine plate material, is obtd. |
