| 摘要 |
PURPOSE:To provide a mask which is freely cleanable and is easy to handle and with which the effect of transfer prevention similar to the effect of a pellicle is obtainable by protecting both sides of a metallic film pattern with quartz plates. CONSTITUTION:Not thin org. films such as pellicles which are liable to rupture but 2nd transparent plates 2 such as tough quartz plates are used. Namely, the transfer by a reduction stepper is executed by using the mask 7 formed by drawing the circuit pattern of chromium oxide on, for example, the quartz plate 2 and sticking the quartz plate 2 further thereto. Since the 2nd transparent quartz plate 2 such as quartz plate is stuck to the surface of the metallic film pattern 1 in such a manner, the effect of the transfer prevention similar to the effect of the pellicle is obtd. even if dust sticks on the surface of the transparent plate. In addition, the handling of the mask is facilitated. |
