发明名称 PLASMA SCATTERING PREVENTION MECHANISM FOR X-RAY GENERATION APPARATUS
摘要 PURPOSE:To make it possible to remove floating scattering substance without bad effect exerted on an object to be irradiated by X-ray by filling helium gas into a target chamber and an X-ray irradiation chamber and also forming helium gas stream crossing a space between a target and the object to be irradiated by X-ray. CONSTITUTION:Helium gas is filled into a target chamber and an X-ray irradiation chamber 3 and a circulation pump 6, an ejection pipe 7 and a sucking pipe 8, etc., are provided as means to form helium gas stream F in the direction of crossing a space between a target 1 and objects 4 and 5 to be irradiated. Substance scattered from the target 1, for instance, collide with helium atoms to slow down, however, the scattering substance which pass through the atoms to scatter toward the side of the objects to be irradiated and floating scattering substance are prevented by the helium gas stream F from entering the X-ray irradiation chamber 3. Because of a result that, helium gas is prevented from rapidly flowing into the target chamber 2 side from the X-ray irradiation chamber 3 side no bad effect, such as, vibration may be exerted on the objects to be irradiated.
申请公布号 JPS63292553(A) 申请公布日期 1988.11.29
申请号 JP19870129042 申请日期 1987.05.25
申请人 AGENCY OF IND SCIENCE & TECHNOL;SHIMADZU CORP 发明人 TANIMOTO MITSUSHI;KOYAMA KAZUYOSHI;KONISHI IKUO
分类号 H05G2/00;H01J35/22;H01L21/027;H01L21/30;H05G1/02 主分类号 H05G2/00
代理机构 代理人
主权项
地址