| 摘要 |
PURPOSE:To accurately process a superconducting layer by a method wherein the surface of the superconducting layer is irradiated with a focused ion beam in order to execute an ion beam etching operation, a recessed groove is formed on the surface of the superconducting layer in order to form a bridge part and a process is finished when an electrical resistance value at the bridge part is changed. CONSTITUTION:A strip (a superconducting layer) 2 composed of Nb is formed on the surface of a substrate 1 composed of quartz glass or the like by a high-frequency magnetron sputtering method by making use of a mask composed of a metal sheet or the like. During this process, the substrate is heated at a high temperature of, e.g., about 300 deg.C and is sputtered in an atmosphere of an inert gas such as Ar gas or the like. Then, the surface of the strip 2 is irradiated with a focused ion beam perpendicularly to a longitudinal direction of the strip 2 a recessed groove 3 is formed by an ion beam etching operation and a bridge part 5 is constituted. The ion beam etching operation is executed by using an ion seed such as Ga<+> or the like in a vacuum atmosphere at a prescribed ion scanning speed, and this scanning operation is repeated many times. While the ion beam etching operation is executed, an electrical resistance value at the bridge part is monitored successively and when the electrical resistance value is changed, a process is finished.
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