发明名称 |
Plasma product treatment apparatus and methods and gas transport systems for use therein |
摘要 |
In semiconductor treatment apparatus with a plasma generating zone, a treatment zone, and a bent path connecting the two so as to block direct transmission of ultraviolet light from the plasma generating zone to the workpiece in the treatment zone, a light trap is provided to suppress indirect transmission of light as by reflection or by transmission within transparent walls of a conduit defining the bent path.
|
申请公布号 |
US4776923(A) |
申请公布日期 |
1988.10.11 |
申请号 |
US19870005034 |
申请日期 |
1987.01.20 |
申请人 |
MACHINE TECHNOLOGY, INC. |
发明人 |
SPENCER, JOHN E.;MILLER, SCOTT S.;SUTTON, WOODIE J.;HOFF, ANDREW M. |
分类号 |
H01J37/32;(IPC1-7):B44C1/22;C03C15/00;C03C25/06 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|