<p>An industrial, compact synchrotron radiation source comprises SR-light absorbers (31, 33) made of a material having a low gas desorption. The absorbers are positioned inside a bending section/vacuum chamber (1). At least the positions marked A and the surface of the electrically conductive beam stabilizers (61) are to be provided with the absorber.</p>
申请公布号
EP0282988(A2)
申请公布日期
1988.09.21
申请号
EP19880104169
申请日期
1988.03.16
申请人
HITACHI, LTD.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION;HITACHI SERVICE ENGINEERING CO., LTD.
