| 摘要 |
PURPOSE:To improve the anti-oxygen plasma etching property of the titled composition by incorporating a specific siloxane polymer and a sensitive substance contg. >=3 numbers of 1,2-naphthoquinone diazido-4-sulfonyl ester group or 1,2-naphthoquinone diazido-5-sulfonyl ester group in one molecule, in the titled composition. CONSTITUTION:The titled composition contains the siloxane polymer shown by formula I or II and >=3 numbers of 1,2-naphthoquinone diazido-4-sulfonyl ester group or 1,2-naphthoquinone diazido-5-sulfonyl ester group in one molecule. In formulas I and II, Y is OH group, etc., R-R'' groups are the same or the different with each other,and are each one kind of the group selected from hydrogen atom, alkyl and phenyl groups, (l)-(n) are each or a positive integer. Thus, the durability of the titled composition against dry-etching using an oxygen plasma is improved. |
