发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION LAMINATE
摘要 PURPOSE:To improve adhesiveness to metal, workability and preservable stability by incorporating a specific linear copolymer addition polymerizable compd. having >=100 deg.C b.p. under atm. pressure and photopolymerization initiator into a titled compsn. CONSTITUTION:This photosensitive material contains the linear copolymer having 2-30wt.% copolymerization rate of acrylic acid, 17-50mol.% content of carboxyl group, 4-30wt.% water absorptivity, and 3,000-400,000 weight average mol.wt., the addition polymerizable compd. having >=100 deg.C b.p. under the atm. pressure and the photopolymerization initiator. The compounding ratio of the addition polymerizable compd. is preferably 20-70pts.wt. per 100pts. wt. total of the linear polymer and the addition polymerizable compd. and the compounding ratio of the photopolymerization initiator is preferably 0.5-10.0 pts.wt. per 100pts.wt. total of the linear copolymer and the addition polymerizable compd. The adhesiveness to metal, workability and the preservable stability are thereby improved.
申请公布号 JPS63197939(A) 申请公布日期 1988.08.16
申请号 JP19870030089 申请日期 1987.02.12
申请人 HITACHI CHEM CO LTD 发明人 MINAMI YOSHITAKA;KAWAGUCHI TAKU;TANAKA YUMIKO;FURUBAYASHI HIROMI;KAKUMARU HAJIME
分类号 G03F7/032;G03F7/004;G03F7/033 主分类号 G03F7/032
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