| 摘要 |
PURPOSE:To obtain a target material whose oxygen concentration is low, whose segration is little and which is composed of fine crystal particles by a method wherein, after the particles struck by a high-speed gas jet stream have been deposited on a substrate, the deposited particles are pressed down in their thickness direction so as to increase the uniformity of the plate thickness and the target material is cooled uniformly. CONSTITUTION:In order to deposit a flow of particles on a substrate 5 uniformly, a gas stream for profile control use is blown toward the flow of particles in the obliquely downward direction from a pair of slit nozzles 4 which are installed at the lower part of atomizers 3 so that the dropping range of the flow of particles can be narrowed down. In addition, in order to make the thickness of the deposited substance uniform in the longitudinal direction, the substrate 5 is moved in the A direction forward and backward at constant speed. After the molten substance has been sprayed, a heat-insulation cover 9 is put immediately on the upper part of a target material 10 so that the cooling direction can be made uniform at the upper part and the lower part. This process is to be executed inside a chamber of a non-oxidative atmosphere. By this setup, it is possible to obtain a soft magnetic sputtering target whose oxygen concentration is low, whose segration is little, which is composed of fine crystal particles and whose brittleness is high.
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