| 摘要 |
PURPOSE:To prevent the deposition of impurities by successively connecting an intake vessel, a dry etching vessel, an ashing vessel, a film deposition vessel, and a takeout vessel respectively through an airtight gate to continuously carry out etching and film deposition in a vacuum. CONSTITUTION:A body to be processed is taken in the vacuum intake vessel 21 through the airtight gate 22, then taken in the dry etching vessel 24 through the airtight gate 23, and subjected to desired etching. The body is then taken in the ashing vessel 26 through the airtight gate 25 to remove the antietching layer, and then transferred to the film deposition vessel 28 through the airtight gate 27, and vacuum film deposition is taken out. The body is taken out into the takeout vessel 31 through the airtight gate 29, and then taken out to the outside from the air tight gate 32 while keeping the inside at the atmospheric pressure. By such a series of processes, the processing can be carried out in good yield with excellent reproducibility.
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