| 摘要 |
A system for determining surface profiles of specimens such as semiconductor wafers includes a drive (46) for mounting the water (w) for oscillatory movement along a line and an optical imaging system (20, 26, 28) overlying the water for focusing a beam on a small spot on the water and including a photodetector (42) for detecting the reflected spot from the water. The spot is scanned along the line of the water while the focal depth of the imaging system is progressively changed and the photodetector and connected digital circuitry generate a plurality of spaced output signals for each scan along the line so that data comprised of a series of spaced signals are provided at a plurality of focus levels extending through the surface profile of the water. Computer means (22) are provided for analyzing the data and providing a graphical output (24a, 24b) ot the surface profile. |
