发明名称 PROCESSES FOR MANUFACTURING DOUBLE REFRACTION PLATES AND DOUBLE REFRACTION PLATES MADE BY SUCH PROCESSES
摘要 In a process for producing a double refraction plate, a transparent dielectric material (23) is directed to and deposited on a substrate (25) obliquely. To control the retardation of the resulting double refraction plate, a polarized light beam having a plane of polarization in a specific direction relative to the substrate (25) is directed onto the substrate (25) through a variable phase plate (33), and the light reflected from the substrate (25) is observed through the variable phase plate (33), as the dielectric material (23) is deposited.
申请公布号 DE3374788(D1) 申请公布日期 1988.01.14
申请号 DE19833374788 申请日期 1983.09.13
申请人 SONY CORPORATION 发明人 MORI, TOSHIO C/O PATENT DEPARTMENT
分类号 G02B1/11;C23C14/22;C23C14/54;G01N21/21;G01N21/23;G02B5/30;(IPC1-7):C23C14/08;C23C14/52;G02B1/10 主分类号 G02B1/11
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