发明名称 SURFACE TREATING DEVICE
摘要 PURPOSE:To prolong the service life of a processing soln. by providing a processing soln. inlet in the vicinity of a treating vessel, furnishing a perforated plate at the lower part of the treating vessel and an overflow part at the upper part, and circulating the processing soln. to remove impurities at the time of simultaneously surface- treating plural materials to be treated. CONSTITUTION:Many materials 7 to be treated are set by a jig 8 in the treating vessel main body 4 wherein surface treatment such as elctroless plating, etching, and surface cleaning is carried out, and an annular processing soln. inlet 1 is provided slightly below the upper opening 6 of the vessel 4. The surface processing soln. is supplied into the vessel 4 from the inlet 1. A part of the soln. descends at a constant speed between the materials 7 to be treated to surface-treat the materials, then enters a heating vessel 15 through the perforated plate 3 and a suction pipe 12, and another part of the soln. overflows from the opening 6 of the vessel into the heating vessel 15 and joins the preceding soln. The temp. of the processing soln. is controlled by a heat exchanger 16. The soln. is taken out through a pipe 20, the contained impurities are removed by a filter 10, and the soln. is returned to the treating vessel 4. The dirt and dust brought in from the opening 6 and those generated in the vessel are removed by the filter on the outside of the vessel, and the vessel is always kept clean and can be used for a long time.
申请公布号 JPS62294182(A) 申请公布日期 1987.12.21
申请号 JP19860136792 申请日期 1986.06.12
申请人 SEIKO EPSON CORP;PURANTETSUKUSU:KK 发明人 OKAMURA MASAO;ONISHI TOSHIYUKI
分类号 C23F1/08;C23C18/16;C23C18/31;C23G3/00;C25D17/00;H05K3/18;H05K3/42 主分类号 C23F1/08
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