发明名称 VACUUM DEPOSITION APPARATUS
摘要 PURPOSE:To form a uniform film on the surface of a large-sized substrate by deflecting electron beams by a means of generating a modulation signal so as to uniformly heat a material to be evaporated in a large-sized crucible. CONSTITUTION:Electron beams 2 are irradiated on a material 13 to be evaporated in a crucible in a converged state. A polarization signal is fed from a means 6 of generating a modulation signal to the Y-axis polarization electrodes 4Y1, 4Y2 or the X-axis polarization electrodes 4X1, 4X2 of a means of deflecting the electron beams 2 so that the electron beams 2 are irradiated on the central part of the material 13 as well as the edge parts. The material 13 is uniformly heated by the irradiation and a uniform film is formed on the surface of a large-sized substrate, or the like.
申请公布号 JPS62207860(A) 申请公布日期 1987.09.12
申请号 JP19860050167 申请日期 1986.03.07
申请人 JEOL LTD 发明人 TOKI KAZUYUKI
分类号 C23C14/30;H01J37/147 主分类号 C23C14/30
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