| 发明名称 |
Composite resist structures. |
| 摘要 |
A composite resist structure having a first underlayer of an aqueous alkaline soluble positive photoresist composition and a second, top layer comprised of the reaction product of a novolak type phenol-formaldehyde resin and a 1,2-naphthoquinone-2-diazidio-4-sulfonyl chloride.
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| 申请公布号 |
EP0225464(A2) |
申请公布日期 |
1987.06.16 |
| 申请号 |
EP19860114968 |
申请日期 |
1986.10.28 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COLLINI, GEORGE JOHN;LOPATA, ALEXANDER DANIEL |
| 分类号 |
C08L61/06;C08K5/29;C08L61/04;G03F7/022;G03F7/095 |
主分类号 |
C08L61/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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