发明名称 PRODUCTION OF STOCK FOR VAPOR DEPOSITION OR TARGET STOCK FOR SPUTTERING
摘要 PURPOSE:To simplify a stage in the case of using a casting ingot as a stock for vapor deposition and the yield of the material and to form a thin film having uniform and good quality by casting a high-purity molten metal made in a vacuum into a water-cooled metal casting mold in the vacuum and quickly cooling the molten metal thereby forming the casting ingot having the shape approximate to the shape of the final product and having the high quality. CONSTITUTION:The high-purity molten metal formed by melting and refining in the vacuum is cast likewise in the vacuum into the water-cooled metal casting mold having the cavity approximate to the shape of the final product and is quickly cooled to obtain the casting ingot which is free from the increase in impurities on the surface part and in the inside part and free from the generation of internal defects such as shrinkage cavities. Such casting ingot allows the formation of the thin magnetic recording medium film having the uniform and good quality in the case of making vapor deposition and sputtering by using the same as the stock or target stock. In addition, plastic working and machining are substantially not required and therefore, the simplification of the stage and the improvement in the yield of the material are attained.
申请公布号 JPS62107855(A) 申请公布日期 1987.05.19
申请号 JP19850249637 申请日期 1985.11.07
申请人 MITSUBISHI METAL CORP 发明人 TAKEIRI TOSHIKI;SAHIRA TATEAKI;YONEZAWA NOBORU;KAWAKAMI KATSUHISA
分类号 C23C14/34;B22D27/04;B22D27/15 主分类号 C23C14/34
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