| 摘要 |
PURPOSE:To prevent reduction in the sensitivity of an X-ray sensitive resist film formed on a body for transfer by laminating a Langmuir film on the resist film and carrying out exposure with X-rays. CONSTITUTION:Exposure is carried out with characteristic X-rays Mo-L(lambda=5.4Angstrom )1 from a rotating anticathode type X-ray source using Mo as a target. An NPR resist 4 is applied to a wafer to 1mum thickness and prebaked at 80 deg.C. Layers of omega-tricosenoic-acid are laminated as a Langmuir film 3, and proximity exposure under the presence of air between a mask and the wafer and development with a developing soln. for 3min are carried out. When four or more layers are laminated, the total thickness is made equal to the residual thickness of a film in helium and the effect of oxygen can be eliminated. Since the film 3 is a very thin film called a four-molecular layer, the attenuation of X-rays is negligibly small and uniform lamination can be carried out. Thus, reduction in the sensitivity of the resist due to oxygen in the air can be prevented. |
