发明名称 MAGNETRON SPUTTERING DEVICE
摘要 PURPOSE:To obtain a required sputtered film even in the presence of both the difference of metal to be sputtered and the change of power and to increase the quality of the product by constituting a magnet wherein a target is affected with the magnetic field of plural divided magnets and making the positions provided with the division magnets changeable. CONSTITUTION:A magnet 4a is constituted of plural divided magnets 8 fitted to a magnet fitting plate 5a and the magnetic field distributions of a target 2 and the magnet 4a are regulated by changing the positions provided with the magnets 8 by means of the selection of many screw holes (not shown in a chart) for the magnets 8 which are previously provided to the fitting plate 5a. Each magnet 8 is fixed on a magnetic material such as a yoke 8b made of iron and formed so that for example, an N polar face of one of two magnetic elements 8a is directed upward and an S polar face of the other thereof is directed upward and the yoke 8b is screwed to the fitting plate 5a. In such a constitution, a required sputtered film can be obtained by regulating the magnetic field distribution of the magnet 4a.
申请公布号 JPS61291972(A) 申请公布日期 1986.12.22
申请号 JP19850132526 申请日期 1985.06.18
申请人 FUJITSU LTD 发明人 SUZUKI MASAFUMI;SHIRAI HIDENOBU
分类号 C23C14/36;C23C14/35;H01L21/285 主分类号 C23C14/36
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