| 摘要 |
PURPOSE:To shorten the production time and to control the depth of ion implantation or thermal diffusion by performing ion implantation or thermal diffusion while impressing an electric field when an optical waveguide is formed. CONSTITUTION:A thin film optical element consists of an (x) or (y) plate LiNbo3 crystal substrate 1, an optical waveguide layer 2 formed by diffusing thermally titanium and protons on the surface of the substrate 1, grating optical couplers 3 and 4, and comb-shaped electrodes 5. An HeNe laser light 6 having 6328Angstrom wavelength is led into the optical waveguide layer 2 from the grating optical coupler 3 and is diffracted by a surface acoustic wave 7 which is generated by impressing an RF power to comb-shaped electrodes 5, and the diffracted light is taken out to the outside by the grating optical coupler 4. Ions are implanted or diffused thermally while impressing the electric field to the substate in this manner, thereby controlling freely the ion distribution of the optical waveguide. |
