| 摘要 |
<p>PURPOSE:To enable the inspection of the drawn pattern by emitting a light smaller than an exposure level even at the time except drawing and comparing the respective reflection light of the time of drawing and except that with drawing data. CONSTITUTION:The titled device is provided with the inspection function which is composed of a beam splitter 10 arranged between a modulator 2 and a rotating mirror 5, a lens 11 accepting the reflected light from the splitter 10, a light detector 12, and a comparator 13 (comparison) arranged between the detector 12 and a computer 1 (drawing data). While an X-Y stage 8 is moved with synchronizing with rotation of the mirror 5, the modulator 2 is turned on or off according to the drawing data, thereby carrying out the drawing of a pattern 9. After development, the pattern 9 is put on the stage 8 again and the modulator 2 is turned on to drive the stage 8. Then the image is formed in the detector 12. The detector 12 photo-electrically transfers and sends it to the comparator where it is compared with the drawing data and the decision on the existence of defectives in the pattern 9 is made.</p> |
