| 摘要 |
PURPOSE:To obtain a pattern having high transmission, sensitivty and by incorporating an alkali-soluble resin, specified compd., photosensitive compd. which produces acid by exposure, and solvent which dissolves these. CONSTITUTION:The resist material contains an alkali-soluble resin, compd. expressed by formula, photosensitive compd. which produces acid by exposure, and solvent which dissolves these materials. In formula, R<1> is an alkyl group or aralkyl group of 1-10 carbon number, R<2> is a hydrogen atom, hydroxyl group, alkoxy group, alkyl group, or OCH2OR<1> (R<1> is same as the R<1> above mentioned). The compd. of this formula is, for example, 1,2-bis(methoxy methoxy)benzene, 1,2-bis(ethoxy methoxy)benzene, etc. After applying the negative resist material on a substrate, the solvent is vaporized to form a film, which is then exposed to light through a mask, heat treated, and developed with an alkali soln. to form a negative pattern. |
