发明名称 COMBINATION GAS CURTAINS FOR CONTINUOUS CHEMICAL VAPOR DEPOSITION PRODUCTION OF SILICON BODIES
摘要 A slim rod is produced from molten silicon. It is heated to the decompn. temp. of a gas mixt. contg. silicon, and then transfered to a chem. vapor deposition chamber. A gas, like hydrogen, or helium is drawn from an inlet into the chem. vapor deposition chamber and moves upward to make a gas curtain. Another gas, like hydrogen chloride is drawn from another inlet and moves downward to make combination gas curtains. The chamber is kept warm enough to decomp. the gas mixt. contg. the silicon. After silicon crystals are deposited on the slim rod, and it grows in size, it is pulled out of the chamber.
申请公布号 KR850001943(B1) 申请公布日期 1985.12.31
申请号 KR19810002705 申请日期 1981.07.25
申请人 MONSANTO CO. 发明人 GUTSCHE, HENRY W.
分类号 C01B33/02;C01B33/035;C30B25/00;C30B25/02;C30B25/10;C30B25/14;C30B25/18;C30B29/06;(IPC1-7):C30B25/00 主分类号 C01B33/02
代理机构 代理人
主权项
地址