发明名称 Method of manufacturing shadow mask.
摘要 <p>A method of manufacturing a shadow mask having apertures of precise shape and size, comprises the steps of forming an etching-protective film having a pattern of a number of apertures on a surface of a thin metal plate containing iron and nickel as major components, and etching the thin metal plate using an etching solution with a viscosity of 1 to 5 centipoise (cP) so as to form a number of apertures therein.</p>
申请公布号 EP0158178(A1) 申请公布日期 1985.10.16
申请号 EP19850103252 申请日期 1985.03.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHTAKE, YASUHISA C/O PATENT DIVISION
分类号 H01J9/14;C23F1/00;C23F1/02;C23F1/28;H01J29/07;(IPC1-7):C23F1/28 主分类号 H01J9/14
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