发明名称 |
Method of manufacturing shadow mask. |
摘要 |
<p>A method of manufacturing a shadow mask having apertures of precise shape and size, comprises the steps of forming an etching-protective film having a pattern of a number of apertures on a surface of a thin metal plate containing iron and nickel as major components, and etching the thin metal plate using an etching solution with a viscosity of 1 to 5 centipoise (cP) so as to form a number of apertures therein.</p> |
申请公布号 |
EP0158178(A1) |
申请公布日期 |
1985.10.16 |
申请号 |
EP19850103252 |
申请日期 |
1985.03.20 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OHTAKE, YASUHISA C/O PATENT DIVISION |
分类号 |
H01J9/14;C23F1/00;C23F1/02;C23F1/28;H01J29/07;(IPC1-7):C23F1/28 |
主分类号 |
H01J9/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|