| 摘要 |
An exposure apparatus has a shelf structure, an exposure base and a movable frame. The shelf structure receives a plurality of palettes on which filmy bodies, such as mask films, are placed. Each palette can be moved vertically together with a partition plate, and it can be moved on the upper surface of the exposure base when it is made flush with the surface as the exposure base abuts on the shelf structure. Each palette is provided with a recession and a notch on its front end for abutting engagement with pins on the exposure base in order to achieve an automatic positioning. The movable frame is allowed to move only vertically and provided with hangers each having a sucking disk for attracting a filmy body. A mask film, sheets of original patterns and a raw film are successively stacked on the exposure base by virtue of vertical movements of the frame and reciprocation of the palettes on the exposure base. A light source for exposure is installed within the exposure base. A lamp is also installed within the base for allowing visual inspection of a combination of a mask film and sheets of original patterns.
|
