| 摘要 |
<p>A step-and-repeat electron image projector for transferring mask patterns repeatedly from a photoemissive cathode reticle (1) onto a target (3) with high resolution capabilities. Accelerated by a uniform electric field E and focussed by a uniform magnetic field H a pattern electron beam is projected from the reticle (1) onto an area of the target with unity magnification. The electric field E is established between the cathode reticle and an electron permeable anode grid (2) situated between the cathode reticle and the target. Alignment of the beam and the target is effected by detecting electrons backscattered from reference markers 30 on the target, a backscattered electron detector (Dl being located between the grid and the target. After exposing one area, the target is moved stepwise on an X-Y table (100) to expose an adjacent area, this procedure being repeated until the whole target has been exposed.</p> |
