| 摘要 |
PURPOSE:To transfer patterns by exposure with high precision even onto the whole surface of a substrate having a large area, by making it possible to transfer onto the substrate the patterns provided on a plurality of masks. CONSTITUTION:Masks 1a-1d whereon different integrated circuit patterns are provided respectively are moved sequentially to an exposure position by rotating, by a motor, a mask stage 2 which hold the masks at equal intervals at positions located at an equal distance from the center 3 of rotation thereof. An illuminating optical system 6 illuminates a mask located at the exposure position by a light emitted from a light source not shown in the figure and having a specific wavelength, so as to expose a photosensitive layer on a substrate 5 through the intermediary of the pattern on the mask and thereby to enable the transfer of the pattern on the mask onto the substrate 5. A substrate stage 8 is so constructed that the substrate 5 can be moved in the directions X-Z and theta. The substrate 5 is disposed in proximity to the mask in the direction Z, while it is moved step by step by the stage 8 so that an arbitrary part thereof can face the mask located at the exposure position. The step-by-step movement of the stage 8 is controlled by a precision length-measuring system using a laser interferometer. |
