Plasma processing method and apparatus for carrying out the same.,申请号EP19840112571-传众专利搜索

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发明名称	Plasma processing method and apparatus for carrying out the same.
摘要
申请公布号	EP0140294(A2)	申请公布日期	1985.05.08
申请号	EP19840112571	申请日期	1984.10.18
申请人	HITACHI, LTD.	发明人	OTSUBO, TORU;AIUCHI, SUSUMU;KAMIMURA, TAKASHI;NOGUCHI, MINORU;FUJII, TERU
分类号	H01L21/302;C23C16/517;H01J37/32;(IPC1-7):H01J37/32	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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