| 摘要 |
PURPOSE:To provide a photosensitive body superior in general electrophotographic characteristics including light fatigue resistance, photosensitivity characteristics, electrostatic charge retentivity, and surface hardness, and capable of forming good images for a long term even in high humidity conditions and against repeated uses by laminating an insulating light transmitting overcoat layer made of amorphous silicon contg. C and O on a photoconductive layer contg. amorphous silicon. CONSTITUTION:A photoconductive layer 2 contg. a-Si formed on a substrate 1 is produced in a thickness of 5-100mum, preferably, 10-60mum, e.g., by the glow discharge decomposition method. An overcoat layer 3 contg. a-Si formed on the layer 2 is produced in 10-3,000nm thickness, e.g. by the same method. This layer 3 is higher in resistivity than the layer 2, and it is formed so as to keep its resistivity almost constant throughout the layer 3 or to gradually raise it from the interface with the layer 2 toward the surface in the thickness direction. Since the layer 3 is made of a-Si or a-Si:Ge contg. C and O not only resistivity but also surface hardness, and further, photosensitivity characteristics and resistance to environmental conditions are remarkably enhanced. |
