发明名称 LASER PROCESSING DEVICE AND LASER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a laser processing device and method which efficiently can provide chips with stable quality.SOLUTION: A laser processing device 1 is equipped with: a laser light source 22; a spatial light modulator 28 that modulates laser light L outputted from the laser light source 22; a condensing lens 38 that condenses the laser light L modulated by the spatial light modulator 28 into a wafer W; a wafer moving part 11 that moves relatively the wafer W to the laser light L; a corrector ring 40 that corrects aberration of the laser light by an amount corresponding to a thickness of the wafer ranging from a laser light incident face to a predetermined reference depth of the wafer W; and a control part 50 that controls the spatial light modulator 28 so that the aberration of the laser light L is corrected by an amount corresponding to a thickness of the wafer ranging from the reference depth to a position at which the laser light is condensed of the wafer W.SELECTED DRAWING: Figure 1
申请公布号 JP2016107334(A) 申请公布日期 2016.06.20
申请号 JP20150049227 申请日期 2015.03.12
申请人 TOKYO SEIMITSU CO LTD 发明人 UEKIHARA AKIRA
分类号 B23K26/53;B23K26/046;B23K26/064;H01L21/301 主分类号 B23K26/53
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