| 摘要 |
PURPOSE:To curtail the time required for loading or unloading wafers in view of realizing automatic process by lifting pallet forming a pallet jig for sputter from the rear side using a rivet and providing clearance for loading or unloading wafers between the rivet and pallet. CONSTITUTION:A pallet for sputtering is placed on the inclined surface of pallet holder 12, it is slid forward until the position where it stops on account of the pallet positioning pin 13, and the pallet is positioned by engaging the leg of pallet 8 with the grooves 12a and 12a' of the pallet holders 12, 12'. Next, a push plate 15 is pushed upward with an operation of eccentric cam 20 by rotating before hand the lever 17. Thereby, the revets 3 and 4 are pushed upward, using a pin 14, as large as the adequate amount being set by the rotating angle adjusting mechanism 24, and accordingly the cam 20 can no longer be returned owing to a tensile spring 22 and clank 21. Thereafter, when an Si wafer 1 is set, the lever 17 is rotated backward. Thereby, the pin 14 is moved downward and the wafer 1 is closed placed in contact with the pallet by the function of revet 3. In addition, the wafer 1 can be removed by reversely following the above steps. |
