| 摘要 |
PURPOSE:To form patterns to specified sizes, by determining the inclined states of the exposing regions of a wafer with respect to an optical axis, and controlling the exposing regions so as to be positioned perpendicularly to the optical axis in accordance with said state. CONSTITUTION:The reduced images of patterns of a mask 2 are arrayed and exposed like squares on the surface of a wafer 1. At every exposure of respective pellets in this state, air is blown out from air nozzles 8 onto the surface of the wafer and the back pressure thereof is detected, whereby the positions of the wafer surface in the optical axis direction corresponding to each nozzle 8 are detected. The inclined state of the exposing region of said pellet is detected from said positions. Upon receiving the detection signal thereof, a control circuit 13 controls the revolutions of motors 11 respectively independently in accordance with said signal. As a result, the inclined states of a supporting plate 10 and the wafer 1 are adjusted, and the exposing region Pa is positioned perpendicularly to the optical axis. The patterns of all the pellets are thus formed to a specified size. |
