| 摘要 |
PURPOSE:To obtain a photosensitive composition improved in developability, by adding a chelating agent soluble in an org. solvent to a photosensitive compsn. consisting of an org. polymer compd. and a diazo compd. CONSTITUTION:A photosensitive compsn. consisting of a diazo resin soluble in an org. solvent and an org. polymer having 10-200 acid value contains 0.1- 10wt% chelating agent soluble in an org. solvent and having >=50% efficiency of sequestering Ca or Mg ion in an aq. soln. of 8 in pH. A preferable content of said org. polymer in said photosensitive compsn. is 80-92wt%, and a preferable content of said chelating agent is 8-20wt%. As said polymer having 10-200 acid value, a copolymer contg. (meth)acrylic acid, crotonic acid, or maleic acid as constituent units, and the like polymer are embodied. |
