| 摘要 |
PURPOSE:To compensate deficiency in exposure resulting from a small rectangular exposure beam and to improve pattern precision by positioning an exposure part by the small rectangular beam at a place sandwiched between exposure parts by two maximum rectangular exposure beams. CONSTITUTION:A register 1 stores X-coordinate data on a starting position X0, a register 2 stores pattern width W, and a register 3 stores maximum rectangular exposure beam size (x). On the basis of values of the registers 2 and 3, a divider 4 outputs the number (n) of parts exposued by maximum rectangular exposure beams and remaining rectangular exposure beam size (a) to registers 5 and 6, respectively. According to coordinate position data from a sequential adder 10, exposure is carried out by the maximum rectangular exposure beams successively. By a signal from a subtracter 8, a skip of polarization to a final maximum rectangular exposure beam over small rectangular exposure beam width (a) is made. Further, coordinate values are outputted from the subtracter 9 to a D-A converter 11 to perform small rectangular exposure beam exposure. |
