| 摘要 |
PURPOSE:To obtain a photomask which reduces defects of a transfer pattern due to stains sticking to the surface as a photomask used for a projection exposure system, by covering the pattern surface with a light-transmissive material. CONSTITUTION:A photomask for pattern transfer through the projection and exposure of a projection exposure system which uses a lens has the pattern surface of a conventional mask 7 covered with a light-transmissive material 8, so even if stains stick to the surface of the photomask 7, the stains are stuck at distance from the focal plane of the lens. Then, no image is formed on a surface of a material to be transferred when projection and exposure are carried out, thus obtaining a photomask for projection and exposure having increased permissiblity to staining. |
