发明名称 Monolithic injection laser arrays formed by crystal regrowth techniques
摘要 A monolithic laser optical cavity structure and method of forming by use of planar photolithographic and crystal regrowth techniques. An original growth multilayer double heterostructure laser structure is grown by LPE on a N+-GaAs substrate. V-grooves are then etched in the epitaxial layers down through the optical cavity by photolithographic techniques. GaAlAs is grown in the V-grooves by crystal regrowth techniques up to the original surface of the laser wafer thus isolating the lasers from each other. The lasers are then separated to form laser arrays.
申请公布号 US4371968(A) 申请公布日期 1983.02.01
申请号 US19810279394 申请日期 1981.07.01
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY 发明人 TRUSSELL, JR., C. WARD;MILLER, JAMES E.
分类号 H01L21/208;H01L21/306;H01L21/76;H01L33/00;H01S5/22;H01S5/40;(IPC1-7):H01S3/19;H01L21/20 主分类号 H01L21/208
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