发明名称 ELECTRON BEAM EXPOSING DEVICE
摘要 PURPOSE:To perform the matching of the coordinate of a deflecting system and the coordinate of length-measuring system by a method wherein the length and inclination of scanning and the like are calibrated based on the value of positional detection, at least at three points by shifting marks, and the values of horizontal and vertical length of measurement of a table. CONSTITUTION:The table 1 is shifted in horizontal direction using a horizontal driving mechanism 7, and also the table is shifted in vertical direction using a vertical driving mechanism 8. The amount of these shiftings is measured by a horizontal length-measuring device 9 and a vertical length measuring device 10. Each measured value of the horizontal length measuring device 9 and the vertical length measuring device 10 is sent to an edge position memory circuit 11. The reflected electron signal sent from the table 1 of electron beam is detected by a detector 12, and this detected signal, together with each value of measured length, is sent to the edge position memory circuit 11. And the information memorized in the edge position memory circuit is processed by a CPU and the like, and the center position of the mark 2 can be detected.
申请公布号 JPS57109334(A) 申请公布日期 1982.07.07
申请号 JP19800185822 申请日期 1980.12.26
申请人 TOKYO SHIBAURA DENKI KK 发明人 KUSAKABE HIDEO
分类号 H01L21/027;H01J37/304;(IPC1-7):01L21/30 主分类号 H01L21/027
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