| 摘要 |
A method for the fabrication of large surface area thin films of vaporizable solids upon substrate materials is provided. The method is particularly applicable to the fabrication of thin films having semiconducting properties useful as solar cells, in the production of microelectronic devices, and other similar purposes. A solid material is vaporized in a temperature-zoned furnace in association with a flowing carrier gas. The vaporized solid is allowed to condense to form an aerosol of disperse sized particles; the smaller of these particles are again vaporized leaving a lesser number of seed aerosol nuclei which are then grown to a larger size and diverted through an orifice to impact upon a substrate moving beneath the orifice thereby forming a particulate film on the substrate.
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