发明名称 |
PHOTOSENSITIVE IMAGE FORMING MATERIAL |
摘要 |
PURPOSE:To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer consisting of N-alkoxyalkylated polyamide and cellulose ester as an org. covering layer and forming a photosensitive photoresist layer on the org. layer. CONSTITUTION:A support is covered with an org. covering layer of a mixture of cellulose ester and N-alkoxyalkylated polyamide having alkoxydialkylation degree of about 10-40% and obtd. by heat reacting polyamide in a mixed solvent of alcohol and aldehydes in the presence of catalyst. The mixing ratio of the cellulose ester depends upon the kind of the ester. On the layer a photosensitive photoresist composition layer consisting mainly of an azide compound, and o-quinone azide compound and a diazo compound is formed to manufacture a photosensitive image forming material. The etchability and peelability of the org. layer disclosed after exposure and development are enhanced, and this material is suitable for use in manufacture of a process master for a photomechanical process. |
申请公布号 |
JPS55155348(A) |
申请公布日期 |
1980.12.03 |
申请号 |
JP19790062934 |
申请日期 |
1979.05.21 |
申请人 |
DAICEL LTD |
发明人 |
KUBO KEIJI;ISHIHARA TETSUO |
分类号 |
G03F7/09;G03C1/52;G03C1/72;G03F1/00;G03F7/105;G03F7/11 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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