发明名称 METHOD OF FORMING CURED SIOX COATING FILM
摘要 PURPOSE:Cured SiOx coating films are formed on the surface of plastic transparent moldings by the high-frequency ion plating method, thus giving cured SiOx coating films free from releasing and cracking. CONSTITUTION:Transparent plastic material 8 that is supported by base holder 9 equipped with electrode 10 on the back surface and boat 15 containing SiOx (x is 1-2) as the vapor source and arranged in vacuum tank 14 of a high-frequency ion plating unit and the transparent plastic material 8 is heated with halogen lamp heater 12 to 60-110 deg.C. Then, an inert gas is introduced into tank 14 and the pressure of the gas is adjusted to 10<-3>-10<-5>Torr. Subsequently, high-frequency power 4 of incidental RF power 50-200W and accelerating voltage 0.25-2.0KV is applied to RF coil 5 to effect the high-frequency discharge and generate the ions of the inert gas. At the same time, a direct current is applied to electrode of vaporizer 1, net electrode 10 to heat the vapor source 2 and vaporize it. The vaporized particles are ionized to form cured SiOx coating film on the surface of the transparent plastic material 8.
申请公布号 JPS5558230(A) 申请公布日期 1980.04.30
申请号 JP19780130026 申请日期 1978.10.24
申请人 ASAHI GLASS CO LTD;MURAYAMA YOUICHI 发明人 MURAYAMA YOUICHI;MIZUHASHI MAMORU;KAMIMORI TADATOSHI;SUZUKI KOUICHI
分类号 C23C14/08;C08J7/06;C23C14/10 主分类号 C23C14/08
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