| 发明名称 |
MANUFACTURE FOR SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To make easy multi layer coating and lifting off, by changing the forming temperature of resist layer for the upper and lower two layers and by restricting the mutual solving for the solvents. |
| 申请公布号 |
JPS547873(A) |
申请公布日期 |
1979.01.20 |
| 申请号 |
JP19770072892 |
申请日期 |
1977.06.21 |
| 申请人 |
FUJITSU LTD |
发明人 |
KANAZAWA MASAO;HOSHINO HITOSHI |
| 分类号 |
H01L21/306;G03F7/26;H01L21/027;H01L21/302 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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