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经营范围
发明名称
XXRAY EXPOSURE METHOD
摘要
PURPOSE:To inhibit the temperature rise of a target by scanning over target surface with an electron beam.
申请公布号
JPS5376668(A)
申请公布日期
1978.07.07
申请号
JP19760152609
申请日期
1976.12.17
申请人
FUJITSU LTD
发明人
HONMA HITOSHI
分类号
G03F7/20;H01L21/027;H01L21/26;H01L21/302
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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