发明名称 PHOTORESIST POLYMER AND PROCESS FOR ITS PREPARATION
摘要 1303120 Increasing the molecular weight of polymers INTERNATIONAL BUSINESS MACHINES CORP 29 July 1970 [2 Sept 1969] 36665/70 Heading C3P [Also in Division G2] A process for increasing the molecular weight of a photosensitive polymeric ester of cinnamic acid, e.g. polyvinyl cinnamate (prepared by esterifying polyvinyl alcohol with cinnamoyl chloride), comprises dissolving the polymeric ester in an inert solvent and treating the polymeric ester with a base at a temperature which is sufficiently low to avoid significant saponification of the polymeric ester. Solvents specified are cyclohexanone, methylene chloride, chlorobenzene and tetrahydrofuran. The base used may be inorganic or organic, e.g. sodium or potassium hydroxide, ammonium hydroxide, sodium carbonate, n-butylamine or triethylamine; the base is suitably used in the form of an aqueous solution. In illustrated procedures the treatment is effected at room temperature. The photosensitive polymers can be exposed, e.g. to U.V. light in the presence of a thiazolinetype photoinitiator, to produce photoresists.
申请公布号 US3627743(A) 申请公布日期 1971.12.14
申请号 USD3627743 申请日期 1969.09.02
申请人 INTERNATIONAL BUSINESS MACHINES CORP. 发明人 RAM K. AGNIHOTRI;FRANK P. HOOD;LEWIS G. LESOINE
分类号 C08F8/00;C08F8/14;G03F7/038;(IPC1-7):C08F27/00 主分类号 C08F8/00
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