| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that can prevent a work chuck from deforming and can improve exposure accuracy by eliminating operational force of a cylinder acting on the work chuck during exposure of a substrate. <P>SOLUTION: In the exposure device, a directional control valve 85 is provided in a piping circuit 80 that connects a work fluid supply source 81 with a cylinder 70 and supplies the work fluid from the work fluid supply source 81 to the cylinder 70, and the directional control valve 85 shuts off the supply of the work fluid to the cylinder 70 as well as to release the inner pressure of the cylinder 70 when at least a substrate W is exposed by irradiation with exposure light. <P>COPYRIGHT: (C)2008,JPO&INPIT |
